Advanced EBL process calibration capability under development with GenISys
The Nanofab now offers advanced, automated electron beam lithography calibration using GenISys Inspec software, integrated with our Zeiss Crossbeam 550L. This powerful SEM-based solution enables rapid, high-precision pattern inspection and seamless data export to Tracer and Beamer software, creating a fast, automated feedback loop for optimizing pattern fidelity and process control. Researchers can contact Chad Eichfeld or Bangzhi Liu to get started.
