Wafer Scalable Single-Layer Amorphous MoO3
What Has Been Achieved:
A process to produce wafer-scale single-layer amorphous MoO3 was developed by UV-ozone oxidation of a MoS2 monolayer. The ultrathin MoO3 was used an active device layer to demonstrate the thinnest oxide-based nonvolatile resistive switching device that exhibits low voltage operation and high ON/OFF ratio.
Importance of the Achievement:
