Equipment
Thermco 2604 Oxidation Furnace
The Thermco 2604 silicon oxidation occupies one tube in the furnace. This small furnace offers economical small batch wet and dry oxidation of silicon wafers up to 150mm (6”) diameter.
Capabilities
- Autoloader
- Can run up to 50 wafers per run
- External torch for generating wafer for wet oxidation
Processes
Silicon oxidation processes are typically run at 1100C.
Restrictions
Only MOS (metal-oxide semi-conductor) compatible materials allowed in the silicon oxidation system, but many non MOS materials are allowed in the Black Max system for oxidation of silicon.
Training: Please contact Guy Lavallee for training or for users who do not need oxidation regularly to have the deposition done for them.